Hyomen Kagaku
Online ISSN : 1881-4743
Print ISSN : 0388-5321
ISSN-L : 0388-5321
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Fabrication of Iron Nickel Nitride Thin Films by Reactive Sputtering
Kazumasa MORIOMasafumi CHIBAYoshiharu KOIZUMI
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2001 Volume 22 Issue 8 Pages 492-496

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Abstract
FeNiN-system materials have a very large magnetic moment that is attractive to be used for high frequencies devices. This investigation focused on magnetic properties of the FeNiN thin films deposited on a substrate at 200oC by magnetron sputtering followed by annealing for 60 min. The energy of exchange coupling for the Fe3NiN thin film deposited at N2 flow ratio FN2 10 % measured was about 1.5 eV from XPS spectrum. The magnetic moment of the Fe3NiN thin film (FN2 = 10 %) was estimated as 7.13 μB based on energy-distribution spectrum shown by XPS measurement. On the other hand, the magnetic moment of the film was evaluated as 7.13 μB based on the lattice constant; a = 0.377 nm that was calculated with a XRD profile, and its magnetization was calculated as IS = 15.5 kG.
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この記事はクリエイティブ・コモンズ [表示 - 非営利 4.0 国際]ライセンスの下に提供されています。
https://creativecommons.org/licenses/by-nc/4.0/deed.ja
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