Abstract
Nanoimprint lithography (NIL), by which resist patterns are fabricated by deforming the physical shape of the resist by embossing with a mold, is a very useful lithography technique. This has been demonstrated for making nanostructure devices such as a quantized magnetic disk. This technique has excellent features, such as being able to create lithographic printing that is sub-10 nm in size over a large area. NIL has increasingly been recognized as a key nanomanufacturing technology that will play a critical role in commercialization of nanostructures. NIL is opening up many opportunities, because of sub-10 nm resolution in both feature size and critical dimension control, low-cost, high-throughput, large area, high fidelity, and excellent repeatability. This article overviews a recent development of NIL and related technologies such as soft lithography.
