Abstract
For large area coating of architectural glass work with excellent quality and performance of self-cleaning, the sputtering method is suitable for the thickness uniformity and the appearance. Usage of a seed layer is illustrated to form the anatase structure of TiO2. The coating shows the good photo-activity and the excellent self-cleaning performance. This seed layer effectively makes the incomparable lattice matching to the anatase TiO2. Finally, it was found that the double side sputtering with high performance LowE coating is real process when the seed layer is utilized.
