Hyomen Kagaku
Online ISSN : 1881-4743
Print ISSN : 0388-5321
ISSN-L : 0388-5321
Special Issue: Plasma Processing of Nanomaterials
Present and Future of Research on Plasma Processing of Nanomaterials
Masaharu SHIRATANIKazunori KOGAGiichiro UCHIDAHyunwoong SEONaho ITAGAKIShinya IWASHITA
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2013 Volume 34 Issue 10 Pages 520-527

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Abstract
This paper reviews production of nanoparticles using low pressure reactive plasmas and its application to quantum dot sensitized solar cells. For the method, nanoparticles of several nm in size with a small size dispersion are produced in gas phase using reactive plasmas, and then the nanoparticles and radicals are co-deposited on a substrate. This method realizes one-step deposition of nanoparticle composite films in a controllable way.
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この記事はクリエイティブ・コモンズ [表示 - 非営利 4.0 国際]ライセンスの下に提供されています。
https://creativecommons.org/licenses/by-nc/4.0/deed.ja
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