Abstract
Sputter deposition of metals into a capture medium with extremely low vapor pressure is a simple and convenient method to generate the metal nanoparticles (NPs) without chemical reactions. By careful selection of the capture medium and its temperature, the size of synthesized NPs can be controlled. Sputtering conditions also play an important role in determining the size of NPs. We synthesized Au NPs in a standard ionic liquid, 1-butyl-3-methylimidazolium tetrafluoroborate by systematically varying the sputtering conditions. It is proved that the temperature of the target and applied voltages have a strong influence on the size of Au NPs, while the working distance between the target and the surface of the capture media, sputtering time, and discharge current have little or no influence. Lower temperatures of the ionic liquid and of the target and higher applied voltage are desired for generating size-controlled smaller NPs.
