Published: April 10, 2016Received: October 16, 2015Released on J-STAGE: April 21, 2016Accepted: November 16, 2015
Advance online publication: -
Revised: -
Secondary ion mass spectrometry (SIMS) and X-ray photoelectron spectroscopy (XPS) have been used for the analysis of inorganic and organic materials. Recently, cluster ion beams have been utilized for the etching of organic materials for depth profiling in SIMS and XPS, and ionization in SIMS. In this paper, recent studies on different types of cluster ions for SIMS and XPS will be reviewed and summarized.
