Abstract
In this review, the potentiality of the OMCVD method for a high-Tc thin film formation technique is described. In the beginning of 1988, Naval Research Institute, Tohoku University and Oki Electric have independently succeeded in the high-Tc ceramics film formation by the OMCVD method. Within less than one year Y-Ba-Cu-O films could be prepared by the method with a good quality of Tc_≥90K and Jc=1.9×106A/cm2 at 77K, which is comparable to that obtained by sputtering or MBE methods. Now, more than ten research groups have joined in this promissing field.
