Abstract
Recently, ion implantation has strongly stimulated efforts for the creation of high performance wide gap oxide materials. This article briefly reviews our recent works on the creation of wide gap oxide glassy and amorphous materials with an optoelectronic function by ion implantation along with the background and expectation for a new extension utilizing properties of photo-active structural defects produced by implantation. The topics cover nanometer-sized colloid embedded glasses for nonlinear optical materials, transparent amorphous oxides with metallic conduction, and fast proton-conducting glasses.
