Ceramic Coating in a Glow Discharge Plasma

Abstract

The plasma deposition technique has been developed for the synthesis of inorganic compounds such as Al₂O₃, TiC, TiN, Si₃N₄ and else in the form of thin solid film.
Among many processes based upon the plasma deposition technique Ion Plating has already been industrialized for the hard ceramic coating on cemented carbide or high speed steel tool with TiC or TiN.
Plasma CVD is also developed to suit for such ceramic coating at moderate temperature and molybdenum parts for the first wall of the nuclear fusion testing devics, JT60, were TiC coated by the modified Plasma CVD process, named TP-CVD process.
Deposition of diamond or cubic boron nitride has been attempted by means of plasma CVD or Ion Bean Deposition process.
This paper discribes asid processes and the characteristics of thin solid films.