Abstract
Thin films of Ni-Cr oxide were prepared by magnetron sputtering of NiO-Cr2O3 (1 : 1 mol ratio) target in a gas mixture of oxygen and argon. The dependence of the partial pressure ratio R of oxygen to the toal sputtering gas on the compositional, optical and electrical properties of the films was investigated from a standpoint of an application to the infrared sensor. With increasing R, the Ni(220) peak of XRD increases, the optical bandgap decreases and the dc conductivity σ as well as the thermistor coefficient Bth increases. It is found that a set of relatively high values of σ and Bth for the infrared sensor is obtained in the range of R around 10%.
