Fabrication of W/C Multilayers by Excimer-Laser-Induced Chemical Vapor Deposition

Abstract

We have studied the characteristics of tungsten and carbon thin films, and tungsten-carbon multilayers prepared by ArF excimer-laser-induced chemical vapor deposition using tungsten hexafluoride and benzene gases. The carbon films deposited at substrate temperatures of 100-300°C are amorphous hydrogenated carbon films with very smooth surfaces. The surface morphology of the tungsten film depends on substrate temperature; at substrate temperatures of 100-200°C, amorphous tungsten films with very smooth surfaces have been obtained. In small-angle X-ray scattering measurement of a W/C multilayer deposited at a substrate temperature of 200°C, a first order of the multilayer reflection was clearly observed. Furthermore, Auger electron spectroscopy showed that W and C layers in the multilayer were periodically deposited.