Shinku
Online ISSN : 1880-9413
Print ISSN : 0559-8516
ISSN-L : 0559-8516
Plasma Characteristics of CH4/H2 Microwave Plasma-Enhanced Chemical Vapor Deposition
Toshiaki YASUI, Ken-ichirou MINAMI, Akira MURAI, Hirokazu TAHARA, Takao YOSHIKAWA
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1995 Volume 38 Issue 7 Pages 646-649

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