1998 Volume 41 Issue 3 Pages 281-284
The tin oxide (SnO2) films are thermally and chemically stable, and have been applied to various fields. The SnO2 (non-doped) films were prepared by a photochemical vapour deposition (photo-CVD) process. TMT (Sn (CH3) 4) and O2 (containing 4 mol.% O3) were used as the source materials, and a low-pressure mercury lamp was used as the light source. By the combination of a linearly focused low-pressure mercury lamp through a semi-cylindrical suprasil window and a reciprocation of the substrate, a good uniformity along the 8 cm ×10 cm area was realised at a substrate temperature of 200 and 250°C. The SnOO2 films prepared at lower temperature had better uniformity. The minimum resistivity of 6.8 × 10-3Ω·cm was obtained at a substrate temperature of 250°C.
