Shinku
Online ISSN : 1880-9413
Print ISSN : 0559-8516
ISSN-L : 0559-8516
Origins of Sample-Surface Contaminants in Loadlock Chamber
Akira KUROKAWAShingo ICHIMURAKen NAKAMURAHiroshi ITOH
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2000 Volume 43 Issue 3 Pages 247-250

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Abstract
The sample contamination in a loadlock chamber, caused by particle sticking, adsorption of gas and moisture in a loadlock chamber and back stream from pumping systems, was investigated. In order to eliminate the first two sources of contamination, a clean silicon sample was prepared in a glove box filled with particle-free nitrogen gas, and the sample was transferred to the loadlock chamber without exposing to air. To observe the contamination during pumping, the last source of contamination, a clean sample was set in the loadlock chamber and after evacuation surface contaminant was evaluated by C1s intensity of XPS spectra. Several evacuation procedures were compared and we concluded that oil-free pumping system is essentially important for contaminant-free introduction of a clean sample.
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© The Vacuum Society of Japan
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