Abstract
Concentric multilayers of alternate high-Z material and low-Z one, deposited on the wire substrate, can be applied to various optical elements for synchrotron radiation (SR) high-brilliance X-ray beamlines. We present new application of the concentric multilayer to optical elements for the SR high-brilliance X-ray beamlines at SPring-8. Three types of Cu/ Al concentric multilayer samples have been fabricated and applied to (1) a spatial resolution test pattern for X-ray computed tomography (CT), (2) a spatial resolution test pattern for the X-ray equipment and (3) a condenser device in the X-ray imaging microscopy. These characteristics have been tested. For the (1), alternate opaque and transparent concentric ring pattern with 2 micron film thickness has been clearly resolved. For the (2), the test pattern can work well in the high energy X-ray region. For the (3), absorption contrast image of a test pattern without modulation by the coherence of the source has been obtained by using the condenser device.
