Abstract
Pd-Ag alloy thin films deposited on silicon substrates by means of rf magnetron sputtering under various deposition parameters, such as rf power, Ar gas pressure and target configuration, were studied using FESEM, XPS and XRD. The surface morphology, chemical composition, chemical state and crystal structure of the films was influenced by various deposition parameters. Two different heat treatments were carried out on the films. In the oxidation atmosphere, the films were almost oxidized, while in the reduction atmosphere, Ag content and lattice constant of the films were increased.
