Study of Pressure Drop in Bag Filter based on Patched Cleaning Model

Abstract

A patched cleaning model was proposed for the pressure drop in a bag filter, in which the filter cloth had two surface areas, i.e., the area with residual dust with the specific resistance ζ_D and the area fraction ε_D, and the perfectly cleaned area with ζ_C and ε_C. The measured pressure drop under the batch filtering operation coincided well with the calculated one with the patched cleaning model through the operation time. Also, the measured pressure drop in a three-compartment bag filter under the continuous filtering operation coincided well with the calculated one with the proposed model by using the specific resistance of dust cake α, the specific resistances of filter cloth ζ_D, ζ_C and the area fraction ε_c that were determined experimentally for the batch filtering operation, though the specific resistance of filter cloth with residual dust ζ_D needed to be corrected for the continuous filtering operation.
The velocity dependency of the specific resistance of dust cake α did not affect the calculation of the pressure drop under the batch filtering operation, though the velocity-dependent α gave a slightly smaller calculated value of the specific resistance of filter cloth with residual dust ζ_D in the three-compartment bag filter under the continuous filtering operation than the constant α. However, the evolution of the pressure drop under the continuous filtering operation was almost independent of the velocity-dependency of α.