Environment
Influence of O2 Concentration on Non-thermal Plasma Decomposition of Halide Gases Containing Cl and F
2005 Volume 31 Issue 3 Pages 226-230
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2005 Volume 31 Issue 3 Pages 226-230
The influence of O2 concentration on the decomposition of halide gases (CCl4, CHF3, CHClF2) by non-thermal plasma was investigated using a wire-in-tube type reactor. Results showed that the decomposition ratio of CCl4, CHF3 and CHClF2 in the plasma reactor was lower in O2–N2 atmosphere than in N2 atmosphere. The major reaction products detected from the decomposition of CHClF2 in O2–N2 atmosphere were HCl, Cl2, HF, F2, CCl2F2, COCl2, COF2 and CO2. In the case of non-thermal plasma decomposition with in-situ absorption of Ca(OH)2, the decomposition ratio of CHClF2 was increased, and halogen byproducts were scavenged by Ca(OH)2, independent of reaction atmosphere. With an increase in O2 concentration, the fraction of CO2 produced by the plasma decomposition of CHClF2 was increased in both the reactors with and without Ca(OH)2 absorbent.
