Chemical Vapor Deposition of Zirconia Film using Zirconium Alkoxide Compound

Abstract

Zirconia film was prepared by thermal decomposition of zirconium tertiary butoxide. Gas chromatography was used to analyze the decomposed gas.
Isobutene was detected at the decomposition of the alkoxide. The isobutene formation reaction began at a lower temperature than zirconia deposition temperature. The crystal structure of zirconia was amorphous below 573K, cubic between 573 and 673K, and monoclinic above 673K. The cubic phase formed at 623K was transformed to monoclinic phase by annealing at above 873K.