Methods for Manufacture of SnO₂ and In₂O₃ Transparent Conducting Films by Vacuum Evaporation

Abstract

Both films of SnO₂ and In₂O₃ which possess excellent properties as transparent conductive films have been practically used in various industrial fields. Recently their demands are greatly increasing in the application to transparent electrodes of a liquid crystal panel display device and so on. The vacuum evaporation methods developed by the authors for manufacture of them have been mainly utilized for their industrial production in our country, having some features preferable to other existing ones. In this paper those techniques are described concerning the vacuum depositions of SnO₂ and In₂O₃ films and the preparation of a conductive anti-reflection coating of 3-layers including its In₂O₃ film on a large sized glass plate.