Development of Laser Plasma Assisted Deposition

Abstract

In this paper, the possibility of a new deposition technique named Laser Plasma Assisted Deposition (LPAD) is explained. It is indicated that photoelectrons on the glass surface were excited due to VUV emissions from the double-stream gas-puff target. The excitation remains for a longer decay time than the irradiated laser pulse width. According to the experimental results, the new binding condition would be created with other particle beams from the evaporator during the excited period with the LPAD technique.