Far-Field Nanostructuring in Dielectric Materials Beyond the Diffraction Limit Using Femtosecond Laser

Abstract

We review the latest progress in the development of far-field nanostructuring technologies based on femtosecond laser direct writing. The principles for breaking through the diffraction limit in the interaction of a focused ultrafast laser beam with dielectric materials are presented, and applications of the femtosecond laser nanostructuring are discussed.