Diagnostics of Gas-Phase Processes in Laser Induced Chemical Vapour Deposition by Laser Spectroscopy

Experiments on Radicals Relevant to Carbon Film Deposition

Abstract

A laser spectroscopic diagnostic system was developed to measure fundamental processes inthe gas-phase of laser-induced chemical vapour deposition. The system was used to detect theradicals relevant to carbon film deposition processes, such as CH, C₂, CH₃ and H. Detailedmeasurements of temporal and spatial behavior of C₂ radical densities were performed. Measuredresults were used to determine the reaction and the diffusion coefficients of C₂ radical. The possibility of measuring the sticking coefficient on a substrate was also discussed.