Fabrication of Soft X-Ray Multilayer Mirrors by Excimer Laser-Induced Chemical Vapor Deposition

Abstract

An argon-fluoride (ArF) excimer laser-induced chemical vapor deposition (LCVD) technique has been developed for fabrication of soft X-ray multilayer mirrors. Film thickness distribution is controlled by scanning a laser beam on the substrate. Tungsten-carbon (W/C) and tungsten-silicon (W/Si) multilayers with a uniform film thickness are deposited and characterized from soft X-ray reflectivity measurement. Furthermore, a W/Si multilayer with laterally varying film thicknesses is successfully fabricated, and the feasibility of LCVD was demonstrated for fabricating multilayer mirrors for high performance soft X-ray focusing systems.