Abstract
A new approach to the fabrication of multilayer mirrors on an atomic scale at soft x-ray wavelengths is desired to overcome serious problems regarding scattering loss at the rough surface and interface of the multilayer. In this review, recent progress regarding novel approaches utilizing atomic layer deposition and atomic layer epitaxy to the fabrication of multilayer structures for soft x-ray wavelengths is detailed. These novel approaches are expected to solve the above-mentioned problems and take the place of conventional sputtering methods because of their control performance of the surface on an atomic scale through their self-limiting functions.
