The Review of Laser Engineering
Online ISSN : 1349-6603
Print ISSN : 0387-0200
ISSN-L : 0387-0200
In situ Measurement Technologies in Semiconductor Manufacturing
Toshitsugu UEDAYasunori OKAMOTOSatoshi NAGAI
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1999 Volume 27 Issue 10 Pages 676-681

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Abstract

In situ measurements in semiconductor manufacturing with lasers are advantageous in that they cause very little disturbance to objects and allow real-time accurate quantification. This paper reviews three in situ measuring methods for gas concentration, particle identification, and wafer temperature based on IR absorption, laser induced breakdown (LIB) and laser ultrasound generation in solids, respectively.

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© The Laser Society of Japan
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