A Study on the Behavior of Secondary Ion Emission under the Low-Energy Ion Irradiation in SIMS Measurements

Abstract

The sputtering behavior of secondary ion from copper surface against primary ion energy less than 3 keV has been studied. A remarked increase of relative ionization coefficient of sputtered ion was observed. This result suggests the existence of another sputteirng mechanism in a low energy region less than 1 keV. The neutralization and re-ionization of irradiated ion in this energy region may cause the change of ionization efficiency.