Bulletin of the Japan Institute of Metals
Online ISSN : 1884-5835
Print ISSN : 0021-4426
ISSN-L : 0021-4426
Thickness Measurement of Ultra-thin Si Oxide Films by ESCA
Seiichi Iwata
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Keywords: electron spectroscopy for chemical analysis, silicon oxide, thickness, ellipsometry, breakdown voltage, ultra-large-scale integration
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1991 Volume 30 Issue 7 Pages 625-632

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