Materia Japan
Online ISSN : 1884-5843
Print ISSN : 1340-2625
ISSN-L : 1340-2625
Selective W-CVD by Hydrogen Passivation Technology and Application to Contact Formation on Shallow Junction
Toshihiko Kosugi, Hiromu Ishii, Yoshinobu Arita
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Keywords: hydrogen passivation, hydrogen termination, pt-silicon, hydroflueric treatment, tungsten chemical vapor deposition
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1996 Volume 35 Issue 4 Pages 332-337

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