Materia Japan
Online ISSN : 1884-5843
Print ISSN : 1340-2625
ISSN-L : 1340-2625
Nanostructure Formation Using Atomic-Layer Si Oxide Films
Masakazu Ichikawa
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Keywords: nanostructure, electron beam lithography, atomic-layer mask, scanning reflection electron microscopy, silicon oxide, silicon, germanium, gallium
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1998 Volume 37 Issue 11 Pages 931-937

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