2009 Volume 21 Issue 1 Pages 1-4
Projection X-ray microscope on the market has been put to practical use for non-destructive inspection of electrical- and electronic-devices and the resolution has reached to 40nm. The improvement of the resolution is greatly due to developments of electron emitter and X-ray image detector and the adoption of “In-Lens Field Emission Gun”. However, there is a tendency that sufficient absorption contrast could not been obtained for the minute sample consisting of light elements. We are aiming to solve the problem in the direction of further improvement of the resolution, at the same time taking advantage of long wavelength X-rays. We will report the present state and future prospect of projection X-ray microscopy.
