Abstract
SynopsisDevelopment of a new series of self-assembling lithographic materials based on polyhedral oligomeric silsesquioxane(POSS) containing block copolymers was achieved. The POSS-containing diblock copolymer of PMMA-b-PMAPOSS was successfully synthesized via living anionic polymerization technique. Thin fi lms were prepared by spin-cast from the polymer solution on silicon wafers and subsequent solvent annealing. Dot-like nanostructures were successfully obtained in the thin fi lms. A long-range nanostructure ordering in the resulting thin fi lms was achieved by using two kinds of Directed Self-Assembly of PMMA-b-PMAPOSS.
