Journal of Network Polymer,Japan
Online ISSN : 2186-537X
Print ISSN : 1342-0577
ISSN-L : 1342-0577
Review
Plating of Hybrid Film Formed by Photoirradiation: Fabrication of A Metallic Pattern by Direct Electroless Copper Deposition on A Photolithographic Pattern
Toshiyuki TAMAI
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2012 Volume 33 Issue 2 Pages 97-103

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Abstract
Printed circuits on a fl exible fi lm are important components for fl exible electronics. Electroless metal deposition is a simple and cost-effective method to fabricate metallic patterns on a fl exible fi lm. We review the formation of a palladiumnanoparticle/silica-nanoparticle/acrylic-polymer hybrid negative pattern on a flexible film by photolithography and its conversion to a copper pattern by electroless plating. The negative pattern of the hybrid was formed by UV-irradiation of the resist film, which contained acrylate monomer, palladium salt, and a photo-radical initiator. The photochemically generated radicals induced the radical polymerization of the acrylate and also reduced the palladium ion to form palladium nanoparticles. A copper film was deposited on the surface of the hybrid pattern by electroless plating. On the surface of the hybrid, the palladium-nanoparticles work as a catalyst, and the nanometer-scale roughness caused with the silica nanoparticles, increases the adhesion between the polymer and copper.
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© 2012 Japan Thermosetting Plastics Industry Association
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