2016 Volume 37 Issue 5 Pages 224-230
Recent research on the design of polymer networks by dual irradiation is reviewed. Especially, photo-degradable system after photopolymerization, photopolymerizable system after photolysis, and photo-cross-linkable system after photopolymerization were introduced. In terms of photo-degradable system after photopolymerization, chain length analysis of the networks can be applied in addition to the fabrication of replicated resin molds. In terms of photocross-linkable system after photopolymerization, a novel methacrylate containing a chalcone unit was synthesized and the photopolymerization was controlled by the choice of photoinitiators and irradiation wavelength. In terms of photopolymerizable system after photolysis, photo-cross-linkable system sensitive to 405 nm-light was successfully devised using a novel photoacid generator. The system is applicable to novel photosensitive materials. Synopsis (Received June 23, 2016 ; Accepted July 19, 2016)