Journal of Network Polymer,Japan
Online ISSN : 2186-537X
Print ISSN : 1342-0577
ISSN-L : 1342-0577
Original
Synthesis of Acetoacetate-Derived Photobase Generators for Generation of Organic Superbases and Their Application for Anionic UV Curing of ThiolEpoxy Mixed Resins
Koji ArimitsuMasahiro FurutAniMasahiro FurutAni
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2017 Volume 38 Issue 4 Pages 158-165

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Abstract

A novel photobase generator derived from acetoacetic acid has been designed and synthesized. Three organic superbases are selected, and used for preparation of the photobase generator-salts. They are decomposed in the methanol solution by irradiation of 10-1000 mJ/cm2 at a wavelength of 254 nm. Phenol red is used for confirming that the corresponding basic species are generated after UV irradiation and subsequent postbaking. These photobase generators (10 mol%) are then added with tetrafunctional thiol and epoxy mixed resins for anionic UV curing. It is found that curing proceeds under mild conditions below 100℃, to fabricate UV-cured films with practical pencil-hardness values. Using a phosphazene as photogenerated superbasic species, UV-cured samples are obtained even at room temperature within 10 min.

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© 2017 Japan Thermosetting Plastics Industry Association
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