Abstract
Water-soluble photosensitive materials have been widely used for printing plate, black matrix and phosphor pattern formation of cathode ray tube, etching resist of metals and so on. Some of these photoresists still contain dichromate salts as a photosensitive material, which may cause environmental pollution. Today, the development of new water-soluble photosensitive materials, non-chromate, have been expected. In the fields of print-circuit board and micro-patterning of LSI, organic solvent-based photoresists are widely used, despite existing of problems on environmental pollution or workers' health. But recently, water-soluble photoresist, called “green resist”, has been recognized. In this report, there are described new water-soluble photosensitive materials we have been developed and their applications to network polymers. These are as follows : for color filter --new water-soluble photoresists showing high transpasrency at visible region after heating; for black matrix and phosphor patterning of cathode ray tube-- new polyfunctional azido-compounds; and a new water-soluble chemical amplified photoresist.
