Journal of Printing Science and Technology
Online ISSN : 1882-4935
Print ISSN : 0914-3319
ISSN-L : 0914-3319
Photo-Resist Material and Process for Photo-Fabrication
Yoshio HASHIMOTO
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JOURNAL FREE ACCESS

1988 Volume 25 Issue 3 Pages 133-143

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Abstract
There are various techniques to make holes or grooves in metal or glass plates. One of these techniques is the Photo-Fabrication. The Photo-Fabrication is the most suitable technique for manufacturing electronic parts and micro machinery parts which require very precise results without burrs, chips or changing the original material characteristics. The first step of the Photo-Fabrication process consists of making the desired pattern images on the surface of the objects by exposing photo or electron beam resists. This technique is called photo-lithography in which the shapes and locations of the patterns are highly dependent upon the resist pattern quality and the fabrication process. Experiences in utilizing this technique have proven that very complicated patterns with high dimensional accuracy can be obtained. The Photo-Fabrication techniques introduced almost 30years ago. During this period, various materials and application techniques have been developed and improved. As the result the Photo-Fabrication techniques have made a tremendous growth in the field of micro fabrication process.
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© The Japanese Society of Printing Science and Technology
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