Special Reviews of Trends in Recent Printed Circuit Technology

Dry Film Photoresist for Fine Pattern Fabrication

Abstract

Dry film photoresist as the material of the image transfer fabrication is required better resolution and definition in manufacturing high density and multilayer PWBs. This paper explains the components of dry film photoresist and the proper condition for manufacturing PWBs in high grade. Besides, we discuss the future of higher resolution image transfer technology in the application of dry film photoresist.