Electrodeposition of Copper from Cu(CF₃COO)₂-CF₃COOH-H₂O Bath

Abstract

The electirodeposition ofr tropper tfrom Cu(CF3COQ)2-CFpC90H-H2Q. bathN hgE.. be-eAnAn ptudigd in comparisQ. n KMith the results obtained in nonaqUeous bqtbs cgntainlng Cu(iCEsCOQ)2 ln the bath of Cu(CF3COO)2(100 g 1) CFsCOOH(Or l N) H20i bright and smooth deposits were obtained at 50 C in the current density range of 4.0 v24 A/dm2, while the current efiliciency of deposition was always 100%. ln such cases, it was found that the apparent anode eMciengy was fi tore than 100% in low cuirent density range. ln the aqueous bath'above mentioned, charge transfer was considered to be the rate determining step for the deposition in the current density range from 4.1 to 13 A/dm2.