NIPPON KAGAKU KAISHI
Online ISSN : 2185-0925
Print ISSN : 0369-4577
Formation of Charge-Reduced Si4+ Species in SiO2 Thin Film by Supported Metal Particles - Possibility of Electronic Metal-Suppo rt Interaction in Silica-Supported Metal Catalysts -
Takemi SHIMAGUCHIMasaharu KOMIYAMA
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1995 Volume 1995 Issue 6 Pages 490-491

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Abstract

Metal-support interaction (MSI) in catalysts supported on silica was studied with model catalyst sys tems in which metal particles were deposited on a thin film silica surface. X-Ray photoelectron spectroscopy on these model catalyst surfaces revealed the formation of charge-reduced Si4+ species due to the deposition of metal particles. The amount of the charge-reduced Si4+ species paralleled the amount of the metal deposited on the surface.

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