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Application of Bayesian optimization for experimental conditions of film deposition
Kentaro KUTSUKAKEKeiichi OSADAKota MATSUIJun YAMAMOTO
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2020 Volume 89 Issue 12 Pages 711-714

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Abstract

Bayesian optimization, which is a machine learning method for sequential optimization, is widely applied as an optimization method that balances exploration and exploitation. In this paper, we first explain the outline of Bayesian optimization, and then introduce its application to the optimization of deposition conditions of epitaxial Si film growth. This paper focus on utilizing the expertise and experience of engineers.

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© 2020 The Japan Society of Applied Physics
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