Implantation of Impurities onto a Crystal Surface by Ion Implantation (II)

Particle-Solid Interaction and Ion Implantation

Abstract

The second general review on ion implantation and its related phenomena is described. Recent development on theories and experiments in this field is discussed in terms of the particle-solid interaction. Particular attention is paid for the results on particle and electron ejection, channeling, sputtering and lattice disorder, which were mainly obtained by Chalk River, Oak Ridge, Aarhus University and Moscow University research groups. Finally, the recent progres in this research field in Japan is reviewed.