Recent Progress in Field Ion Microscopy

Abstract

The atom-probe field-ion microscope identifies a single atom or analyzes a small surface area seen in an field-ion microscope.
The present time of flight type achieves a resolution ΔM/M of 1/1000 and is thus adequate for most routine metallurgical application. Previous atom-prove investigation of metallurgical interest are listed and the usefulness of the instrument for metallurgical studies is discussed.
Through the use of the field ion microscope, it is possible to image directory individual atoms and its cluster on metal surfaces and to examine the details of the random walk. New surface effects, discovered by field ion microscope, are reviewed. Possibility of atomic layer depth profiling of a compound semiconductor surface and interfaces are also discussed.