Oyo Buturi
Online ISSN : 2188-2290
Print ISSN : 0369-8009
Plasma-etch-induced damage and its reduction in ultralarge-scale integration
Kazuo NOJIRI, Tatsumi MIZUTANI
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Keywords: plasma etching, plasma damage, ultralarge-scale integration, crystalline defect, metal contamination, contact resistance, electron cyclotron resonance plasma, charge buildup, gate oxide breakdown
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1995 Volume 64 Issue 11 Pages 1115-1119

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[in Japanese]
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© The Japan Society of Applied Physics
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