Abstract
Advanced oxidation process (AOP) is very effective technique for degradation and mineralization of organic
pollutants. On the other hand, ultrasonic atomization is a very useful technique to produce ultrasonic mist which
consists of submicron-scale droplets. Using these techniques, volatile organic compound (VOC) gas was decomposed
on the mist surface by OH radicals generated by AOPs, and water-soluble decomposition intermediates were rapidly
captured into the mist. As a result, the removal rate of toluene under UV/H2O2/mist condition was faster than that
under UV/H2O2 condition. This result indicated that toluene gas could easily react with OH radicals on the mist surface
using ultrasonic atomization because gas-liquid interfaces increased by the mist generation. Furthermore, we tried
degradation experiments of toluene gas under conditions with ozone addition. Ozone also reacts with H2O2 to generate
OH radicals (peroxone reaction) on the mist surface, and toluene gas was effectively decomposed there by OH radicals.
Since this reaction process strongly affected the improvement of toluene gas removal and mineralization, it can be a
useful air purification technique.