Abstract
Silicon nitride with Yb2O3 and MgO or MgSiN2 as sintering additives was sintered at 1900°C for 2, 48h under 0.9MPa N2. The inner part and the surface of sintered Si3N4 were observed by SEM and TEM. In addition, microstructure and composition of grain boundary phase were examined by HREM and STEM. The triple point of MgSiN2 doped Si3N4 was different from that of MgO doped Si3N4.