Fabrication of Patterned Ceramic Thin Film by the Liquid Phase Deposition (LPD) Method

Abstract

Site-selective direct fabrication of ceramic thin films has been successfully achieved by using surface coating of patterned metal by the liquid phase deposition (LPD) method. The patterned metal was prepared on glass, Si and/or polymer substrates by sputtering method as an activated site. By a scanning electron microscopy (SEM) and energy-dispersive X-ray (EDX) microanalysis, it was confirmed that ceramic thin films were selectively deposited on the activated site. It was investigated that the effect of substrate on film deposition and revealed the deposition of thin film on activated substrate occurred rapidly compared with glass substrate. We also show the pre-treatment of the reaction solution plays an important role for fabrication of micropatterned ceramic thin films.