Abstract
The phenomenon of phase separation in glass thin films has not been studied in detail. In order to investigate phase separation in films, 12Na20-88SiO2 films deposited on Si02 by RF magnetron sputtering method were prepared. Although they separated into two phases by heat treatment, the microstructure in the phase separation was different from that of the bulk Na2O-SiO2 system and was strongly influenced by the Na distribution along the depth ofthe films.