Abstract
Micropatterning of zinc oxide thin film was realized using site-selective deposition which is involved molecule recognition of inorganic-organic .A SAM which has a pattern of both silanol and alkyl surfaces was immersed in an aqueous solution containing Zn precursor. ZnOH was deposited and a thin film was grown on the silanol surface selectively. ZnOH thin film fabricated by site-selective deposition has no cracks and the feature edge acuity of its micropattern was much higher than that of the micropattern obtained by lift-off process. And ZnO thin film was by annealing ZnOH thin film at 300°C.
