Adhesion Properties of Alumina Films Obtained by CVD Technique

Abstract

Alumina films with various thicknesses were synthesized using a chemical vapor deposition technique operating under atmospheric pressure. The films were deposited on silicon and stainless steel substrates. The failure modes associated with the test occurred at different critical loads and appear to be distinct. In the case of film deposited on silicon, a complete delamination causing tearing of the film from the substrate was observed.